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Physical and photocatalytic properties of laser fabricated crystalline TiO.sub.2./sub. at low temperatures
- 1.0349017 - FZÚ 2012 RIV RO eng J - Journal Article
Remsa, Jan - Jelínek, M. - Kocourek, T. - Mikšovský, J. - Studnička, Václav - Vorlíček, Vladimír - Sváta, V. - Vymětalová, V.
Physical and photocatalytic properties of laser fabricated crystalline TiO2 at low temperatures.
Journal of Optoelectronics and Advanced Materials. Roč. 12, č. 3 (2010), s. 754-757. ISSN 1454-4164. E-ISSN 1841-7132
Institutional research plan: CEZ:AV0Z10100522
Keywords : pulsed laser deposition * TiO2 * contact angle * photocatalytic properties * thin films
Subject RIV: BM - Solid Matter Physics ; Magnetism
Impact factor: 0.412, year: 2010
We report on an extensive study of the deposition of titanium dioxide layers by pulsed laser deposition at either room temperature or at 200°C (300°C, 400°C, 500°C) from pure titanium and titanium dioxide targets. Some amorphous samples were annealed by the rapid thermal annealing method. The study is focused on the effect of variation of pressure of the reactive oxygen and the inert argon atmospheres, and the mixtures of both. The laser fluency varied in the range 2 J/cm2 to 9 J/cm2. The crystalline structure was characterized by X-ray diffraction and Raman Spectroscopy and for the study of the surface properties, atomic force microscopy was used. The TiO2 photocatalytic characteristics were determined using 4-chlorphenol solution degradation evaluated by pH measurement. Polycrystalline (anatase, rutile, and brookite) and amorphous layers exhibiting photocatalytic behavior were obtained at low substrate temperatures (200°C).
Permanent Link: http://hdl.handle.net/11104/0006069
Number of the records: 1