Enhancement of YBCO thin film thermal stability under 1 ATM oxygen pressure by Intermediate Cu.sub.2./sub. O nanolayer

0347871 - FZÚ 2011 RIV US eng J - Journal Article
Cheng, L. - Wang, X. - Yao, X. - Wan, W. - Li, F.H. - Xiong, J. - Tao, B.W. - Jirsa, Miloš
Enhancement of YBCO thin film thermal stability under 1 ATM oxygen pressure by Intermediate Cu₂ O nanolayer.
Journal of Physical Chemistry B. Roč. 114, č. 22 (2010), s. 7543-7547. ISSN 1520-6106. E-ISSN 1520-5207
R&D Projects: GA MŠMT(CZ) ME10069
Institutional research plan: CEZ:AV0Z10100520
Keywords : YBCO thin films * thermal stability * thin film growth orientation * temperature optical microscopy
Subject RIV: BM - Solid Matter Physics ; Magnetism
Impact factor: 3.603, year: 2010

The melting process of YBa₂ Cu₃ O_x (YBCO or Y123) films under oxygen atmosphere was observed in situ by means of high-temperature optical microscopy. The films were c-axis oriented, with two different in-plane orientations (denoted as 0 and 45°). In the 45°-oriented films, HRTEM detected an intermediate Cu₂ O nanolayer in the vicinity of the interface. The thermal stability of the 45°-oriented YBCO films dramatically grew with increasing oxygen partial pressure.
Permanent Link: http://hdl.handle.net/11104/0006036