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IR Laser CVD of Nanostructured Si/Ge Alloy from Silane-Germane Mixture
- 1.0346363 - ÚCHP 2011 RIV NL eng J - Journal Article
Křenek, Tomáš - Murafa, Nataliya - Bezdička, Petr - Šubrt, Jan - Pola, Josef
IR Laser CVD of Nanostructured Si/Ge Alloy from Silane-Germane Mixture.
Journal of Analytical and Applied Pyrolysis. Roč. 89, č. 1 (2010), s. 137-141. ISSN 0165-2370. E-ISSN 1873-250X
R&D Projects: GA MŠMT LC523
Institutional research plan: CEZ:AV0Z40720504; CEZ:AV0Z40320502
Keywords : silane * germane * ir laser
Subject RIV: CF - Physical ; Theoretical Chemistry
Impact factor: 2.234, year: 2010
IR laser-irradiation of an equimolar silane-germane mixture in Ar results in the decomposition of both compounds and allows chemical vapour deposition (CVD) of solid metastable and nanostructured Si/Ge film.
Permanent Link: http://hdl.handle.net/11104/0187411
Number of the records: 1