Electron attenuation anisotropy at crystal surfaces from LEED

0336724 - FZÚ 2010 RIV NL eng J - Journal Article
Romanyuk, Olexandr - Bartoš, Igor
Electron attenuation anisotropy at crystal surfaces from LEED.
[Hloubka tlumeni elektronu v krystalech z LEEDu.]
Surface Science. Roč. 603, č. 17 (2009), s. 2789-2792. ISSN 0039-6028. E-ISSN 1879-2758
R&D Projects: GA ČR GA202/07/0601; GA AV ČR IAA100100628
Institutional research plan: CEZ:AV0Z10100521
Keywords : electron attenuation length, low energy electron diffraction, photoelectron diffraction, electron–solid scattering and transmission, copper * low energy electron diffraction * photoelectron diffraction * electron–solid scattering and transmission * copper
Subject RIV: BM - Solid Matter Physics ; Magnetism
Impact factor: 1.798, year: 2009
http://dx.doi.org/10.1016/j.susc.2009.07.024

Dynamical theory of electron scattering is used to describe the electron transport in the surface regions of crystals. The angle resolved attenuation length of electrons is derived from the transmitted LEED electron current decay. Electron attenuation length energy dependence and anisotropy in polar angle are found for crystalline Cu(111) for two high symmetry azimuths. Pronounced anisotropy in polar angle distributions of attenuation lengths is found to be in qualitative agreement with the results obtained from the photoelectron diffraction. Comparison with the attenuation lengths obtained from semiclassical simulations for amorphous copper is given. This comparison demonstrates that simple transfers of the smoothly behaving surface sensitivity from amorphous materials oversimplifies the electron attenuation process and can lead to incorrect results in quantitative analyses of crystalline surfaces.

Transport elektronů u povrchu krystalické látky byl popsán pomocí dynamické teorie rozptylu elektronů. Zavistlost hloubky tlumení elektronů na energii, azimutalním a polarním úhlu je velmi anizotropní a liší se od tlumení v amorfních látkách. Bylo ukázáno, že jednoduchý přenos zavistlosti hloubky tlumení z amorfných materialů do krystalických muže vést k nesprávným výsledkům při kvantitativní analýze krystalických povrchů.
Permanent Link: http://hdl.handle.net/11104/0180900