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Sensitivity of CdS photoresistors in ultraviolet spectrum and technology

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    0303844 - URE-Y 20010048 RIV CZ eng C - Conference Paper (international conference)
    Franc, J. - Novotný, Jan - Jirásek, L. - Petráň, S. - Kliment, P.
    Sensitivity of CdS photoresistors in ultraviolet spectrum and technology.
    Plzeň: Západočeská univerzita, 2001. ISBN 80-7082-758-0. In: International Conference Applied Electronics 2001. - (Pinker, J.), s. 70-73
    [Applied Electronics 2001. Pilsen (CZ), 05.09.2001-06.09.2001 (K)]
    R&D Projects: GA AV ČR KSK1010104 Projekt 04/01:4046
    Grant - others:GA MSk(CZ) OC P3.160
    Institutional research plan: CEZ:AV0Z2067918
    Keywords : photoresistors * ultraviolet detectors * instrumentation
    Subject RIV: BM - Solid Matter Physics ; Magnetism

    Several groups of photoresistors based on thin film of evaporated CdS were prepared. Groups were distinguished in concentrations of acceptors (Cu) and donors (Cl) which were used in activation of layers. Each group was characterised by means of slope in visible range and by relative sensitivity in UVA region. Relative sensitivity in UVA region decreases when concentrations of activators increasee.
    Permanent Link: http://hdl.handle.net/11104/0114028


     
     

Number of the records: 1  

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