The plasma-polymerized films of dichloro(methyl)phenylsilane

0205323 - UPT-D 20000102 RIV CZ eng J - Journal Article
Čech, V. - Horvath, P. - Zemek, J. - Trchová, M. - Matějková, Jiřina
The plasma-polymerized films of dichloro(methyl)phenylsilane.
Czechoslovak Journal of Physics. Roč. 50, Supp. S3 (2000), s. 356-364. ISSN 0011-4626.
[Plasma Physics and Technology /10./. Praha, 06.07.2000-09.07.2000]
R&D Projects: GA ČR GV106/98/K013; GA ČR GA104/00/0708
Institutional research plan: CEZ:AV0Z2065902
Subject RIV: JR - Other Machinery
Impact factor: 0.298, year: 2000

Thin plasma polymer films were deposited from a mixture of dichloro(methyl)phenylsilan (DCMPS) vapour and gaseous hydrogen in a r.f. (13.56 MHz) capacitive coupling deposition system on pieces of silicon wafers. Some samples were annealed in vacuum at the temperature ranging from 450 to 700 Celsius degrees. Chemical composition, structure and surface morphology of annealed samples and those stored in air at room temperature were studied by FTIR, XPS, SEM, and optical microscopy. Termal stability and a decomposition of the plasma polymer with increasing temperature were characterized by termogravimetry together with mass spectrometry. The plasma polymer was stable up to a temperature of 300 Celsius degrees. Above that temperature the material started to decompose together with additional cross-linking due to incorporation of extra oxygen atoms forming new siloxane bonds. The plasma polymer was tough at room temperature but much more brittle at elevated temperatures.
Permanent Link: http://hdl.handle.net/11104/0002832