Number of the records: 1  

Dual implantation of Si with boron and argon ions

  1. 1.
    0183382 - UJF-V 940052 RIV DE eng J - Journal Article
    Popok, V. - Hnatowicz, Vladimír - Kvítek, Jiří - Švorčík, V. - Rybka, V.
    Dual implantation of Si with boron and argon ions.
    Physica Status Solidi A. Roč. 141, - (1994), s. 93-98. ISSN 0031-8965
    Impact factor: 0.596, year: 1994
    Permanent Link: http://hdl.handle.net/11104/0079883
     

Number of the records: 1  

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