Number of the records: 1
Dual implantation of Si with boron and argon ions
- 1.0183382 - UJF-V 940052 RIV DE eng J - Journal Article
Popok, V. - Hnatowicz, Vladimír - Kvítek, Jiří - Švorčík, V. - Rybka, V.
Dual implantation of Si with boron and argon ions.
Physica Status Solidi A. Roč. 141, - (1994), s. 93-98. ISSN 0031-8965
Impact factor: 0.596, year: 1994
Permanent Link: http://hdl.handle.net/11104/0079883
Number of the records: 1