Number of the records: 1
Photocatalytic Degradation Rate of Oxalic Acid on the Semiconductive Layer of n-TiO.sub.2./sub. Particles in the Batch Mode Plate Reactor. Part I: Mass Transfer Limits
- 1.0180739 - UFCH-W 990157 RIV GB eng J - Journal Article
Kulas, J. - Roušar, I. - Krýsa, J. - Jirkovský, Jaromír
Photocatalytic Degradation Rate of Oxalic Acid on the Semiconductive Layer of n-TiO2 Particles in the Batch Mode Plate Reactor. Part I: Mass Transfer Limits.
Journal of Applied Electrochemistry. Roč. 28, č. 8 (1998), s. 843-853. ISSN 0021-891X. E-ISSN 1572-8838
R&D Projects: GA ČR GA203/96/0883
Subject RIV: CF - Physical ; Theoretical Chemistry
Impact factor: 0.928, year: 1998
Permanent Link: http://hdl.handle.net/11104/0077378
Number of the records: 1