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Nonequilibrium model of laser-induced phase change processes in amorphous silicon thin films
- 1.0174518 - MU-W 980027 RIV US eng J - Journal Article
Černý, R. - Přikryl, Petr
Nonequilibrium model of laser-induced phase change processes in amorphous silicon thin films.
Physical Review. E. Roč. 57, č. 1 (1998), s. 194-202. ISSN 1063-651X
R&D Projects: GA ČR GA201/97/0217; GA AV ČR IAA1010719
Subject RIV: BJ - Thermodynamics
Impact factor: 2.066, year: 1998
Permanent Link: http://hdl.handle.net/11104/0071524
File Download Size Commentary Version Access Prikryl.pdf 1 193.5 KB Publisher’s postprint require
Number of the records: 1