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Silicon thin films deposited at very low substrate temperatures

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    0134414 - FZU-D 20030314 RIV NL eng J - Journal Article
    Ito, M. - Ro, K. - Yoneyama, S. - Ito, Y. - Uyama, H. - Mates, Tomáš - Ledinský, Martin - Luterová, Kateřina - Fojtík, Petr - Stuchlíková, The-Ha - Fejfar, Antonín - Kočka, Jan
    Silicon thin films deposited at very low substrate temperatures.
    Thin Solid Films. Roč. 442, - (2003), s. 163-166. ISSN 0040-6090. E-ISSN 1879-2731
    Institutional research plan: CEZ:AV0Z1010914
    Keywords : amorphous materials * microcrystal-Si * chemical vapor deposition(CVD)
    Subject RIV: BM - Solid Matter Physics ; Magnetism
    Impact factor: 1.598, year: 2003

    The influence of the substrate temperature (in the wide range of 35-200 o C) on the structure and properties of silicon thin films was studied. It seems that low substrate temperature a parameter window exists where the silicon thin films can be grown with the properties combining both crystalline and amorphous behavior.
    Permanent Link: http://hdl.handle.net/11104/0032317
     

Number of the records: 1  

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