Number of the records: 1
CN.sub.x./sub.H.sub.y./sub. films obtained by ECR plasma activated CVD: the role of substrate bias (DC, RF) and some other deposition parameters in growth mechanism
- 1.0132805 - FZU-D 20000057 RIV CH eng J - Journal Article
Shaginyan, L. R. - Fendrych, František - Jastrabík, Lubomír - Soukup, Ladislav - Kulikovsky, V. Yu. - Musil, Jindřich
CNxHy films obtained by ECR plasma activated CVD: the role of substrate bias (DC, RF) and some other deposition parameters in growth mechanism.
Surface and Coatings Technology. 116/119, - (1999), s. 65-73. ISSN 0257-8972
R&D Projects: GA AV ČR IAA1010827
Institutional research plan: CEZ:AV0Z1010914
Subject RIV: BM - Solid Matter Physics ; Magnetism
Impact factor: 1.008, year: 1999
The composition, optical and mechanical propertiesf the CNxHy films deposited at various process conditions were investigated by electron microprobe analysis, IR spectroscopy and microhardness measurements.
Permanent Link: http://hdl.handle.net/11104/0030804
Number of the records: 1