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Photolelectron diffraction study of ultrathin Fe films on Cu{111}

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    0132406 - FZU-D 990356 RIV US eng J - Journal Article
    Theobald, A. - Schaff, O. - Hirschmugl, C. J. - Fernandez, V. - Schindler, K. M. - Polčík, Martin - Bradshaw, A. M. - Woodruff, D. P.
    Photolelectron diffraction study of ultrathin Fe films on Cu{111}.
    Physical Review. B. Roč. 59, č. 3 (1999), s. 2313-2319. ISSN 0163-1829
    Grant - others:DE(CZ) 05625EBA6
    Subject RIV: BM - Solid Matter Physics ; Magnetism
    Impact factor: 3.008, year: 1999
    Permanent Link: http://hdl.handle.net/11104/0030432

     
     

Number of the records: 1  

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