Number of the records: 1
Photolelectron diffraction study of ultrathin Fe films on Cu{111}
- 1.0132406 - FZU-D 990356 RIV US eng J - Journal Article
Theobald, A. - Schaff, O. - Hirschmugl, C. J. - Fernandez, V. - Schindler, K. M. - Polčík, Martin - Bradshaw, A. M. - Woodruff, D. P.
Photolelectron diffraction study of ultrathin Fe films on Cu{111}.
Physical Review. B. Roč. 59, č. 3 (1999), s. 2313-2319. ISSN 0163-1829
Grant - others:DE(CZ) 05625EBA6
Subject RIV: BM - Solid Matter Physics ; Magnetism
Impact factor: 3.008, year: 1999
Permanent Link: http://hdl.handle.net/11104/0030432
Number of the records: 1