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Ion assisted deposition of crystalline TiNi thin films by electron cyclotron resonance plasma enhanced sputtering

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    0132073 - FZU-D 980320 RIV JP eng J - Journal Article
    Mišina, Martin - Setsuhara, Y. - Miyake, S.
    Ion assisted deposition of crystalline TiNi thin films by electron cyclotron resonance plasma enhanced sputtering.
    Japanese Journal of Applied Physics. Roč. 36, 6A (1997), s. 3629-3634. ISSN 0021-4922. E-ISSN 1347-4065
    Impact factor: 1.261, year: 1997
    Permanent Link: http://hdl.handle.net/11104/0030111


     
     

Number of the records: 1  

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