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Inductively-coupled-plasma assisted planar magnetron discharge for enhanced ionization of sputtered atoms
- 1.0132071 - FZU-D 980318 RIV JP eng J - Journal Article
Setsuhara, Y. - Kamai, M. - Miyake, S. - Musil, Jindřich
Inductively-coupled-plasma assisted planar magnetron discharge for enhanced ionization of sputtered atoms.
Japanese Journal of Applied Physics. Roč. 36, 7B (1997), s. 4568-4571. ISSN 0021-4922. E-ISSN 1347-4065
Impact factor: 1.261, year: 1997
Permanent Link: http://hdl.handle.net/11104/0030109
Number of the records: 1