Number of the records: 1
Depth inhomogenity of deposited thin films: Applications to semi-insulating polycrystalline silicon films
- 1.0131738 - FZU-D 980451 RIV NL eng J - Journal Article
Kučírková, A. - Navrátil, K. - Zemek, Josef
Depth inhomogenity of deposited thin films: Applications to semi-insulating polycrystalline silicon films.
Thin Solid Films. Roč. 323, - (1998), s. 53-58. ISSN 0040-6090. E-ISSN 1879-2731
R&D Projects: GA AV ČR IAA1010609
Subject RIV: BM - Solid Matter Physics ; Magnetism
Impact factor: 1.019, year: 1998
Permanent Link: http://hdl.handle.net/11104/0029787
Number of the records: 1