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Deposited by reactive magnetron sputtering nanocrystalline titanium carbide films

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    0131487 - FZU-D 980509 RIV CZ eng J - Journal Article
    Hovorka, D. - Mišina, Martin - Bell, Albert J. - Studnička, Václav - Musil, Jindřich
    Deposited by reactive magnetron sputtering nanocrystalline titanium carbide films.
    Czechoslovak Journal of Physics. Roč. 48, č. 8 (1998), s. 963-971. ISSN 0011-4626.
    [Joint Vacuum Conference of Hungary, Austria, Slovenia and Croatia /12./. Debrecen, 26.05.1997-29.05.1997]
    R&D Projects: GA ČR GV106/96/k245
    Subject RIV: BM - Solid Matter Physics ; Magnetism
    Impact factor: 0.348, year: 1998
    Permanent Link: http://hdl.handle.net/11104/0000526

     
     

Number of the records: 1  

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