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Discharge characteristics of facing target sputtering device using unbalanced magnetrons

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    0131150 - FZU-D 960503 RIV US eng J - Journal Article
    Muralidhar, G. K. - Musil, Jindřich - Kadlec, Stanislav
    Discharge characteristics of facing target sputtering device using unbalanced magnetrons.
    Journal of Vacuum Science & Technology A : Vacuum, Surfaces and Films. Roč. 14, - (1996), s. 2182-2186. ISSN 0734-2101. E-ISSN 1520-8559
    Impact factor: 1.613, year: 1996

    Permanent Link: http://hdl.handle.net/11104/0029235

     
     

Number of the records: 1  

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