0025580 - FZÚ 2006 RIV US eng J - Journal Article
Juha, Libor - Bittner, Michal - Chvostová, Dagmar - Krása, Josef - Kozlová, Michaela - Pfeifer, Miroslav - Polan, Jiří - Präg R., Ansgar - Rus, Bedřich - Stupka, Michal - Feldhaus, J. - Létal, V. - Otčenášek, Zdeněk - Krzywinski, J. - Nietubyc, R. - Pelka, J. B. - Andrejczuk, A. - Sobierajski, R. - Ryc, L. - Boody, F. P. - Bartnik, A. - Mikolajczyk, J. - Rakowski, R. - Kubát, Pavel - Pína, L. - Horváth, M. - Grisham, M. E. - Vaschenko, G. O. - Menoni, C.S. - Rocca, J.J. - Fiedorowicz, H.
Short-wavelength ablation of molecular solids: pulse duration and wavelength effects.
[Krátkovlnná ablace molekulárních pevných látek: vlivy vlnové délky a trvání impulzu.]
Journal of Microlithography Microfabrication and Microsystems. Roč. 4, č. 3 (2005), 033007/1-033007/11. ISSN 1537-1646.
[SPIE Conference on Fourth Generation X-Ray Sources and Optics. Denver, 00.08.2004-00.08.2004]
R&D Projects: GA MŠMT(CZ) LN00A100; GA MŠMT(CZ) 1P04LA235
Institutional research plan: CEZ:AV0Z10100523
Keywords : ablation * XUV * x-rays * x-ray laser * material processing * microlithography
Subject RIV: BH - Optics, Masers, Lasers
Impact factor: 1.389, year: 2005
Permanent Link: http://hdl.handle.net/11104/0115955