Growth and properties of full Heusler Co.sub.2./sub.TiSn epitaxial thin films

0587319 - FZÚ 2025 RIV NL eng J - Journal Article
Shamardin, Artem - Cichoň, Stanislav - Rameš, Michal - de Prado, Esther - Volfová, Lenka - Kmječ, Tomáš - Fekete, Ladislav - Kopeček, Jaromír - Kos, P. - Nowak, L. - Heicl, J. - Zázvorka, J. - Hamrle, J. - Veis, M. - Heczko, Oleg - Lančok, Ján
Growth and properties of full Heusler Co₂TiSn epitaxial thin films.
Journal of Alloys and Compounds. Roč. 1002, Oct (2024), č. článku 175296. ISSN 0925-8388. E-ISSN 1873-4669
R&D Projects: GA MŠMT(CZ) EH22_008/0004591; GA ČR(CZ) GA24-11361S; GA MŠMT LM2023065
Institutional support: RVO:68378271
Keywords : Heusler alloys * thin film * epitaxy * ferromagnetism * Kerr effect * DFT
OECD category: Condensed matter physics (including formerly solid state physics, supercond.)
Impact factor: 6.2, year: 2022
Method of publishing: Open access

Full Heusler Co2TiSn thin film were grown by DC magnetron sputtering on MgO(001) substrates at temperatures from ambient up to 800°C. The state of films was investigated by wide range of techniques including atomic force and electron microscopy, X-ray diffraction and photoelectron spectroscopy, magnetometry, and magnetooptical ellipsometry supported by ab initio calculation.
Permanent Link: https://hdl.handle.net/11104/0354559