Microstructure and physical properties of black-aluminum antireflective films

0585771 - FZÚ 2025 RIV GB eng J - Journal Article
Correa, Cinthia Antunes - More Chevalier, Joris - Hruška, Petr - Poupon, Morgane - Novotný, Michal - Minárik, P. - Hubík, Pavel - Lukáč, František - Fekete, Ladislav - Prokop, Dejan - Hanuš, J. - Valenta, J. - Fitl, Přemysl - Lančok, Ján
Microstructure and physical properties of black-aluminum antireflective films.
RSC Advances. Roč. 14, May (2024), s. 15220-15231. E-ISSN 2046-2069
R&D Projects: GA ČR GA23-05002S; GA MŠMT LM2023051; GA MŠMT(CZ) EH22_008/0004596
Institutional support: RVO:68378271 ; RVO:61389021
Keywords : thin film * aluminum * antireflective film
OECD category: Coating and films; Materials engineering (UFP-V)
Impact factor: 3.9, year: 2022
Method of publishing: Open access

The microstructure and physical properties of reflective and black aluminum were compared for layers of different thicknesses deposited by magnetron sputtering on fused silica substrates. Reflective Al layers followed the Volmer–Weber growth mechanism classically observed for polycrystalline metal films. On the contrary, the extra nitrogen gas used to deposit the black aluminum layers modified the growth mechanism and changed the film morphologies. Nitrogen cumulated in the grain boundaries, favoring the pinning effect and stopping crystallite growth. High defect concentration, especially vacancies, led to strong columnar growth. Properties reported for black aluminum tend to be promising for sensors and emissivity applications.
Permanent Link: https://hdl.handle.net/11104/0353450

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