CuFeO.sub.2./sub. prepared by electron cyclotron wave resonance-assisted reactive HiPIMS with two magnetrons and radio frequency magnetron sputtering

0577303 - FZÚ 2024 RIV US eng J - Journal Article
Písaříková, Aneta - Olejníček, Jiří - Venkrbcová, Ivana - Nožka, L. - Cichoň, Stanislav - Azinfar, A. - Hippler, Rainer - Helm, C.A. - Mašláň, M. - Machala, L. - Hubička, Zdeněk
CuFeO₂ prepared by electron cyclotron wave resonance-assisted reactive HiPIMS with two magnetrons and radio frequency magnetron sputtering.
Journal of Vacuum Science & Technology A : Vacuum, Surfaces and Films. Roč. 41, č. 6 (2023), č. článku 063005. ISSN 0734-2101. E-ISSN 1520-8559
R&D Projects: GA MŠMT(CZ) EF16_019/0000760; GA ČR(CZ) GA21-04477S
Grant - others:OP VVV - SOLID21(XE) CZ.02.1.01/0.0/0.0/16_019/0000760
Research Infrastructure: CzechNanoLab II - 90251
Institutional support: RVO:68378271
Keywords : ECWR * magnetron sputtering * RF
OECD category: Condensed matter physics (including formerly solid state physics, supercond.)
Impact factor: 2.9, year: 2022
Method of publishing: Open access

In this study, thin films of CuFeO2 were prepared using radio frequency reactive sputtering (RF) and reactive high-power impulse magnetron sputtering combined with electron cyclotron wave resonance plasma (HiPIMS-ECWR). The plasma was characterized using an RF ion probe. Plasma density, tail electron energy, and electron temperature were extracted from the measured data. The films were deposited on fluorine-doped tin oxide-coated glass and quartz glass, with the substrates being heated during the deposition process. The final delafossite CuFeO2 structure was formed after annealing in an argon gas flow at 550–600 °C. The ideal deposition conditions were found to be with a stoichiometric ratio of Cu:Fe = 1:1, which was the optimal condition for creating the delafossite CuFeO2 structure. The measured optical bandgap of CuFeO2 was 1.4 eV.
Permanent Link: https://hdl.handle.net/11104/0346510