Influence of the magnetic field on the extension of the ionization region in high power impulse magnetron sputtering discharges

0574651 - FZÚ 2024 RIV US eng J - Journal Article
Antunes, V.G. - Rudolph, M. - Kapran, Anna - Hajihoseini, H. - Raadu, M.A. - Brenning, N. - Gudmundsson, J.T. - Lundin, D. - Minea, T.
Influence of the magnetic field on the extension of the ionization region in high power impulse magnetron sputtering discharges.
Plasma Sources Science & Technology. Roč. 32, č. 7 (2023), č. článku 075016. ISSN 0963-0252. E-ISSN 1361-6595
Institutional support: RVO:68378271
Keywords : magnetron sputtering * HiPIMS * ionization region * magnetic field * optical emission spectroscopy
OECD category: Fluids and plasma physics (including surface physics)
Impact factor: 3.8, year: 2022
Method of publishing: Limited access
https://doi.org/10.1088/1361-6595/ace847

The high power impulse magnetron sputtering (HiPIMS) discharge brings about increased ionization of the sputtered atoms due to an increased electron density and efficient electron energization during the active period of the pulse. The ionization is effective mainly within the electron trapping zone, an ionization region (IR), defined by the magnet configuration. Here, the average extension and the volume of the IR are determined based on measuring the optical emission from an excited level of the argon working gas atoms. For particular HiPIMS conditions, argon species ionization and excitation processes are assumed to be proportional. Hence, the light emission from certain excited atoms is assumed to reflect the IR extension. The light emission was recorded above a 100 mm diameter titanium target through a 763 nm bandpass filter using a gated camera.
Permanent Link: https://hdl.handle.net/11104/0349495