Comparison of PMMA shrinkage in ion beam lithography: PMMA on glass substrate vs free-standing PMMA film

0574018 - ÚJF 2024 RIV NL eng J - Journal Article
Romanenko, Oleksandr V. - Lavrentiev, Vasyl - Borodkin, Andrei - Havránek, Vladimír - Macková, Anna
Comparison of PMMA shrinkage in ion beam lithography: PMMA on glass substrate vs free-standing PMMA film.
Nuclear Instruments & Methods in Physics Research Section B. Roč. 538, MAY (2023), s. 123-130. ISSN 0168-583X. E-ISSN 1872-9584
R&D Projects: GA MŠMT EF18_053/0017163
Institutional support: RVO:61389005 ; RVO:67985882
Keywords : PMMA shrinkage * Ion beam lithography * Microstructuring * Diffraction grating
OECD category: Nuclear physics; Optics (including laser optics and quantum optics) (URE-Y)
Impact factor: 1.3, year: 2022
Method of publishing: Limited access
https://doi.org/10.1016/j.nimb.2023.02.001

The present work focuses on the shrinkage of PMMA films under irradiation and its application to the creation of optical devices. We prepared the free-standing PMMA films in four different thicknesses (13, 21, 32, and 43 & mu,m), and PMMA films of the same thickness, but deposited on a glass substrate. A diffraction grating was chosen as the optical device to show the applicability of the method. The study revealed that at a film thickness of 13-32 & mu,m, the shrinkage of the free-standing film increases proportionally to its thickness, while the film on the substrate does not have a pronounced dependence. Films with the thickness of 43 & mu,m do not follow this trend. It was found that under the same irradiation conditions, the film on the substrate shrinks more compared to the free-standing film. Interference patterns from the created diffraction gratings were shown to present spurious illumination areas.
Permanent Link: https://hdl.handle.net/11104/0344381