Characteristics of a pulsed hollow cathode discharge operated in an Ar+O.sub.2./sub. gas mixture and deposition of copper nickel oxide thin films

0573847 - FZÚ 2024 RIV GB eng J - Journal Article
Kapran, Anna - Hippler, Rainer - Wulff, H. - Olejníček, Jiří - Písaříková, Aneta - Čada, Martin - Hubička, Zdeněk
Characteristics of a pulsed hollow cathode discharge operated in an Ar+O₂ gas mixture and deposition of copper nickel oxide thin films.
Vacuum. Roč. 215, Sept. (2023), č. článku 112272. ISSN 0042-207X. E-ISSN 1879-2715
R&D Projects: GA MŠMT(CZ) EF16_019/0000760; GA ČR(CZ) GA21-04477S
Grant - others:OP VVV - SOLID21(XE) CZ.02.1.01/0.0/0.0/16_019/0000760
Institutional support: RVO:68378271
Keywords : hollow cathode discharg * plasma diagnostics * mixed CuNiO thin film * film diagnostics * photoelectrochemical activity
OECD category: Fluids and plasma physics (including surface physics)
Impact factor: 4, year: 2022
Method of publishing: Limited access
https://doi.org/10.1016/j.vacuum.2023.112272

A hollow cathode discharge with a CuNi (Cu50Ni50) cathode is operated inside a vacuum chamber with Ar gas flowing through its nozzle. O2 gas is admitted to the vaccum chamber. Typical Ar+O2 gas pressures are in the range of 2–50 Pa. The energy distribution of plasma ions is investigated with the help of energy-resolved mass spectrometry. Singly charged Ar+ and molecular O+2 ions are the most abundant ionic species. Deposition rate and heat flux to a substrate increase as function of discharge current. At high pressures, the deposition rate is further increased by the directional gas flow, which becomes more focused onto the substrate. Deposited and annealed thin films are analysed by X-ray diffraction and Raman spectroscopy.
Permanent Link: https://hdl.handle.net/11104/0344198