Enhanced growth rate of diamond films at low temperature in focused microwave plasma system

0570793 - FZÚ 2024 RIV CZ eng C - Conference Paper (international conference)
Babčenko, Oleg - Bydžovská, Irena - Fait, Jan - Shagieva, Ekaterina - Ondič, Lukáš - Kromka, Alexander
Enhanced growth rate of diamond films at low temperature in focused microwave plasma system.
NANOCON 2022 Conference Proceedings. Ostrava: Tanger Ltd., 2023, s. 77-83. ISBN 978-80-88365-09-9. ISSN 2694-930X.
[14th International Conference on Nanomaterials - Research & Application - NANOCON 2022. Brno (CZ), 19.10.2022-21.10.2022]
R&D Projects: GA MŠMT(CZ) LUASK22147; GA MŠMT(CZ) EF16_019/0000760
Grant - others:AV ČR(CZ) LQ100102001; OP VVV - SOLID21(XE) CZ.02.1.01/0.0/0.0/16_019/0000760
Program: Prémie Lumina quaeruntur
Research Infrastructure: CzechNanoLab - 90110
Institutional support: RVO:68378271
Keywords : well-faceted diamonds * low temperature deposition * high growth rate * low non-diamond content * focused plasma
OECD category: Nano-materials (production and properties)
https://www.confer.cz/nanocon/2022/4587-enhanced-growth-rate-of-diamond-films-at-low-temperature-in-focused-microwave-plasma-system

The low temperature (< 500 °C) diamond film deposition on fused silica in two different focused microwave plasma systems, i.e. a multimode clamshell cavity (MCC) and a rotational ellipsoid cavity (REC) reactor, was investigated. During the experiments, the methane to hydrogen ratio, in the hydrogen-rich process gas mixture, varied from 1 % to 15 % for MCC and from 1 % to 9 % for REC. The grown films were analyzed by scanning electron microscopy and Raman shift measurements. The outcomes of the study and enhanced diamond growth at low temperatures is advantageous for overcoating of fused silica as well as thermally sensitive substrates, e.g. optical elements, photonic crystals, sensors, etc.
Permanent Link: https://hdl.handle.net/11104/0342132