Optical emission spectroscopy analysis of microwave plasma-enhanced chemical vapor deposition systems dynamic gas response

0570231 - FZÚ 2024 RIV US eng J - Journal Article
Lambert, Nicolas - Sung, Kil-dong - Mortet, Vincent
Optical emission spectroscopy analysis of microwave plasma-enhanced chemical vapor deposition systems dynamic gas response.
Physica Status Solidi A. Roč. 220, č. 4 (2023), č. článku 2200322. ISSN 1862-6300. E-ISSN 1862-6319
R&D Projects: GA MŠMT(CZ) EF16_019/0000760; GA ČR(CZ) GA21-03538S
Grant - others:OP VVV - SOLID21(XE) CZ.02.1.01/0.0/0.0/16_019/0000760
Institutional support: RVO:68378271
Keywords : diamond growth * dynamic gas response * microwave plasma-enhanced chemical vapor deposition (MWPECVD) * optical emission spectroscopy (OES)
OECD category: Fluids and plasma physics (including surface physics)
Impact factor: 2, year: 2022
Method of publishing: Limited access
https://doi.org/10.1002/pssa.202200322

Microwave plasma-enhanced chemical vapor deposition (MWPECVD) is widely used for the growth of synthetic doped diamond for electronic and electrochemical applications. Recent results have shown the possible enhancement of phosphorus incorporation using the pulsed gas injection growth method. It is therefore important to understand the dynamics of precursor gases to optimize the dopants incorporation in diamond. In this work, the dynamic response of different gases (N-2, CH4, and O-2) impulses in hydrogen plasma is studied in two different MWPECVD reactors: a lab made NIRIM type reactor, and a commercial reactor made by Seki Diamond Systems. These reactors of different volumes are operated at different pressure and total gas flow. The time responses to the precursor gas injection are recorded by optical emission spectroscopy. Experimental time responses are fitted using an impulse response equation.
Permanent Link: https://hdl.handle.net/11104/0349378