Generation of uniform X-ray illumination and its application to X-ray diffraction microscopy

0568858 - FZÚ 2023 RIV CH eng J - Journal Article
Kunio, K. - Espinoza Herrera, Shirly J. - Khakurel, Krishna
Generation of uniform X-ray illumination and its application to X-ray diffraction microscopy.
Photonics. Roč. 9, č. 12 (2022), č. článku 934. E-ISSN 2304-6732
R&D Projects: GA MŠMT EF16_019/0000789; GA MŠMT EF15_003/0000447; GA MŠMT(CZ) LM2018141
Grant - others:OP VVV - ADONIS(XE) CZ.02.1.01/0.0/0.0/16_019/0000789; OP VVV - ELIBIO(XE) CZ.02.1.01/0.0/0.0/15_003/0000447
Institutional support: RVO:68378271
Keywords : X-ray microscopy * flat-top X-ray beams * X-ray free-electron lasers
OECD category: Particles and field physics
Impact factor: 2.4, year: 2022
Method of publishing: Open access

X-ray diffraction microscopy (XDM) is an established lens-less imaging method extensively practiced at synchrotrons and X-ray free-electron lasers (XFELs). XDM is broadly operated in two different modes: scanning and non-scanning. The non-scanning mode of operation in XDM is commonly called coherent diffraction imaging (CDI) and has been the key research direction of many XFEL facilities. This method typically images objects smaller than the size of the illumination, which precludes the imaging of a large group of samples physically larger than the illumination. Furthermore, satisfying this requirement at X-ray free-electron lasers tremendously reduces the volume of practically useful data, leading the experimental scheme to be less efficient. Such a limitation can be circumvented by using a uniform illumination probe rather than the traditional Gaussian-focused probe from the X-ray focusing optics.
Permanent Link: https://hdl.handle.net/11104/0340130