Nanosphere lithography-based fabrication of spherical nanostructures and verification of their hexagonal symmetries by image analysis

0567910 - FZÚ 2023 RIV CH eng J - Journal Article
Domonkos, M. - Kromka, Alexander
Nanosphere lithography-based fabrication of spherical nanostructures and verification of their hexagonal symmetries by image analysis.
Symmetry-Basel. Roč. 14, č. 12 (2022), č. článku 2642. E-ISSN 2073-8994
R&D Projects: GA MŠMT LM2018110
Institutional support: RVO:68378271
Keywords : nanosphere lithography * self-assembly * hexagonal symmetry * plasma etching * image analysis * defect detection
OECD category: Nano-materials (production and properties)
Impact factor: 2.7, year: 2022
Method of publishing: Open access

This paper reviews technological challenges in NSL mask preparation, its modification, and quality control. Spin coating with various process parameters (substrate wettability, solution properties, spin coating operating parameters) are discussed to create a uniform monolayer from monodisperse polystyrene (PS) nanospheres with a diameter of 0.2–1.5 um. The prepared highly ordered nanopatterned arrays (from circular, triangular, pillar-shaped structures) are applicable in many different fields (plasmonics, photonics, sensorics, biomimetic surfaces, life science, etc.).

Permanent Link: https://hdl.handle.net/11104/0339173