High deposition rate films prepared by reactive HiPIMS

0567523 - FZÚ 2023 RIV GB eng J - Journal Article
Mareš, P. - Dubau, M. - Polášek, J. - Mates, Tomáš - Kozák, T. - Vyskočil, J.
High deposition rate films prepared by reactive HiPIMS.
Vacuum. Roč. 191, Sep (2021), č. článku 110329. ISSN 0042-207X. E-ISSN 1879-2715
R&D Projects: GA MŠMT LM2018110; GA MŠMT(CZ) EF16_019/0000760; GA MPO FV30177
Grant - others:OP VVV - SOLID21(XE) CZ.02.1.01/0.0/0.0/16_019/0000760; AV ČR(CZ) StrategieAV21/6
Program: StrategieAV
Institutional support: RVO:68378271
Keywords : reactive magnetron sputtering * HiPIMS * Monte-carlo simulations * deposition rate * sputtering yield
OECD category: Coating and films
Impact factor: 4.110, year: 2021
Method of publishing: Limited access
https://doi.org/10.1016/j.vacuum.2021.110329

High power impulse magnetron sputtering (HiPIMS) is characterized by a very high current density at the target during each pulse. A large fraction of sputtered target material is ionized, which allows the preparation of hard and defect-free coatings. Compared to the conventional sputtering methods, HiPIMS technology possesses a certain drawback, i.e. lower deposition rate. A promising variation, i.e. reactive HiPIMS, was described by a mathematical model (S. Kadlec et al. JAP 121 (2017) 171910). One of the fundamental results shows that reactive HiPIMS can deliver higher deposition rates compared to the mid-frequency pulsed dc magnetron sputtering (Mf-PCDMS) due to a lower degree of target poisoning. To confirm these theoretical results, series of experiments were performed in laboratory deposition system with different target materials (Al, Cr, Ti, Zr, Hf, Ta, Nb). We supported our experimental results by Monte-Carlo simulations performed in SRIM and SDTrimSP simulation software.
Permanent Link: https://hdl.handle.net/11104/0338777