A sampler of diffraction and refraction optically variable image elements

0564672 - ÚPT 2023 RIV CZ eng C - Conference Paper (international conference)
Horáček, Miroslav - Krátký, Stanislav - Matějka, Milan - Chlumská, Jana - Meluzín, Petr - Pirunčík, J. - Aubrecht, I. - Kotrlý, M. - Kolařík, Vladimír
A sampler of diffraction and refraction optically variable image elements.
NANOCON 2021 - Conference proceedings. Ostrava: Tanger Ltd., 2021, s. 436-441. ISBN 978-80-88365-00-6. ISSN 2694-930X.
[International Conference on Nanomaterials - Research & Application /13./ NANOCON. Brno (CZ), 20.10.2021-22.10.2021]
R&D Projects: GA MV(CZ) VI20192022147
Institutional support: RVO:68081731
Keywords : diffraction * refraction * e-beam writer * embossing * galvanic replication * mastering * optically variable image element * security * valuables
OECD category: Nano-processes (applications on nano-scale)
https://www.confer.cz/nanocon/2021/4371-a-sampler-of-diffraction-and-refraction-optically-variable-image-elements

Diffraction and refraction optically variable image elements are basic building blocks of planar structures for advanced security of documents and valuables. A sampler formed by an array of 36 diffraction structures binary, tertiary, quaternary and blazed gratings (period range 400 nm 20,000 nm) represents a cross-section throughout technological steps mastering, galvanic replication and embossing. Electron-beam writing technology with Gaussian beam and electron energy of 100 keV, with very small forward scattering of high energy electrons and with the possibilities to create a linear grating with the minimal period of 100 nm, was used to create the master. An important advantage of high-resolution electron-beam lithography is its substantial flexibility in combining possible planar structures with significantly different parameters, such as very dense and relatively shallow structures together with deep structures (approx. 10 microns) with precise shapes (micro-lenses or Fresnel structures). For protection of documents and valuables, interesting results are induced with planar optical structures consisting of non-periodic arrangements, which are characterized by high robustness to counterfeiting and imitation. While the origination process is available for grating period down to 100 nm, the mass replication technology appears to be a bottleneck of the entire technological process. Measurement of topology and profiles of the structures by atomic forces microscope and documenting the quality of technological process of the three steps of replication of planar optically variable elements was performed for all 36 structure types of sampler.
Permanent Link: https://hdl.handle.net/11104/0336321