Effect of pulsed methane gas flow on the incorporation of phosphorous in diamond

0556046 - FZÚ 2023 RIV CH eng J - Journal Article
Mortet, Vincent - Taylor, Andrew - Davydova, Marina - Lamač, Marcel - Lambert, Nicolas - Elantyev, I. - Lorinčík, J. - Troadec, D. - Vronka, Marek - Potocký, Štěpán
Effect of pulsed methane gas flow on the incorporation of phosphorous in diamond.
Diamond and Related Materials. Roč. 124, April (2022), č. článku 108928. ISSN 0925-9635. E-ISSN 1879-0062
R&D Projects: GA MŠMT(CZ) EF16_019/0000760; GA ČR(CZ) GA21-03538S
Grant - others:OP VVV - SOLID21(XE) CZ.02.1.01/0.0/0.0/16_019/0000760
Research Infrastructure: CzechNanoLab - 90110
Institutional support: RVO:68378271
Keywords : diamond * phosphorus doping * optical emission spectroscopy * PECVD
OECD category: Condensed matter physics (including formerly solid state physics, supercond.)
Impact factor: 4.1, year: 2022
Method of publishing: Limited access
https://doi.org/10.1016/j.diamond.2022.108928

The synthesis of n-type phosphorus-doped diamond is essential for the development of diamond-based bipolar devices. Although demonstrated 20 years ago, it remains a complex problem due to low incorporation efficiency and low maximum concentrations. Previous works showed the deleterious influence of methinophosphide formation in a methane/hydrogen/phosphine plasma on the growth of phosphorous doped diamond using the chemical vapor deposition method. In this work, we investigate the effect of pulsing methane during microwave plasma enhanced chemical vapor deposition to avoid the formation of HCP and to increase phosphorus incorporation efficiency and maximum concentration in diamond.
Permanent Link: http://hdl.handle.net/11104/0330422