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WO.sub.3./sub. and WO.sub.3-x./sub. thin films prepared by DC hollow cathode discharge

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    0555890 - FZÚ 2023 RIV GB eng J - Journal Article
    Olejníček, Jiří - Hrubantová, Aneta - Volfová, Lenka - Dvořáková, Michaela - Kohout, Michal - Tvarog, Drahoslav - Gedeon, O. - Wulff, H. - Hippler, Rainer - Hubička, Zdeněk
    WO3 and WO3-x thin films prepared by DC hollow cathode discharge.
    Vacuum. Roč. 195, Jan (2022), č. článku 110679. ISSN 0042-207X. E-ISSN 1879-2715
    R&D Projects: GA MŠMT(CZ) EF16_019/0000760; GA ČR(CZ) GA21-04477S; GA MPO FV20580
    Grant - others:OP VVV - SOLID21(XE) CZ.02.1.01/0.0/0.0/16_019/0000760
    Institutional support: RVO:68378271
    Keywords : tungsten oxide * WO3 * hollow cathode discharge * sputtering * thin films
    OECD category: Fluids and plasma physics (including surface physics)
    Impact factor: 4, year: 2022
    Method of publishing: Limited access
    https://doi.org/10.1016/j.vacuum.2021.110679

    Photoactive semiconducting crystalline films of non-stoichiometric tungsten oxides (WO3-x, 0 ≤ x ≤ 3) were deposited by DC hollow cathode discharge from a tungsten nozzle in a reactive Ar + O2 atmosphere. The ratio of tungsten to oxygen in the layer was driven by controlling the O2 flow. All layers were prepared on soda-lime glass substrate (SLG) and on glass substrates coated with an FTO thin film and after deposition were annealed in air or argon atmosphere. The properties of WO3-x layers were analyzed with respect to their potential applications. Surface morphology was analyzed by SEM, qualitative phase analysis by XRD and Raman spectroscopy, chemical composition by EDX and photoactivity of individual samples by linear voltammetry. The layers stoichiometrically closest to WO3 and annealed in an argon atmosphere showed the highest photoactivity response.
    Permanent Link: http://hdl.handle.net/11104/0330352

     
     
Number of the records: 1  

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