A method for surface modification of semiconductor nanoparticles using non-thermal plasma activated water and product thereof

0555710 - FZÚ 2022 RIV eng P - Patent Document
Galář, Pavel - Kůsová, Kateřina - Fučíková, Anna - Khun, J.
A method for surface modification of semiconductor nanoparticles using non-thermal plasma activated water and product thereof.
2021. Owner: Fyzikální ústav AV ČR, v. v. i. Date of the patent acceptance: 24.03.2021. Patent Number: LU101406
R&D Projects: GA MŠMT LM2018110; GA MŠMT(CZ) EF16_019/0000760; GA ČR(CZ) GA18-05552S
Grant - others:OP VVV - SOLID21(XE) CZ.02.1.01/0.0/0.0/16_019/0000760
Institutional support: RVO:68378271
Keywords : non-thermal plasma * activated liquids * silicon nanocrystals
OECD category: Fluids and plasma physics (including surface physics)
https://worldwide.espacenet.com/patent/search/family/068426779/publication/LU101406B1?q=LU101406

The present invention relates to methods providing modification of surface chemistry of semiconductor nanoparticles dispersed in non-thermal plasma activated water. The surface modification can be carried out at ambient conditions using inexpensive equipment. In a preferred embodiment, the plasma activated water is prepared using transient spark pulsedischarge at ambient conditions. Under these conditions, the nanoparticle surface is exposed to reactive species originating from (i) air, (ii) water and (iii) products of chemical reactions between the reactive species themselves. The exposure of the semiconductor nanoparticles to the cocktail of the mentioned reactive species results in the modification of the original surface termination, primarily by the products of reactive oxygen and nitrogen reactive species. These modified nanoparticles exhibit greater chemical stability, solubility in water and in the case of luminescent nanoparticles also improved optical performance.
Permanent Link: http://hdl.handle.net/11104/0330176