Direct current and high power impulse magnetron sputtering discharges with a positively biased anode

0552303 - FZÚ 2022 RIV US eng J - Journal Article
Hippler, Rainer - Čada, Martin - Hubička, Zdeněk
Direct current and high power impulse magnetron sputtering discharges with a positively biased anode.
Journal of Vacuum Science & Technology A : Vacuum, Surfaces and Films. Roč. 39, č. 4 (2021), č. článku 043007. ISSN 0734-2101. E-ISSN 1520-8559
R&D Projects: GA MŠMT(CZ) EF16_019/0000760; GA MPO FV20580; GA ČR GA19-00579S
Grant - others:OP VVV - SOLID21(XE) CZ.02.1.01/0.0/0.0/16_019/0000760
Institutional support: RVO:68378271
Keywords : magnetron * mass spectrometry * Langmuir probe * anode bias * HiPIMS
OECD category: Fluids and plasma physics (including surface physics)
Impact factor: 3.234, year: 2021
Method of publishing: Open access

A magnetron sputtering discharge with a positively biased anode in argon gas is investigated by Langmuir probe diagnostics and by energy-resolved mass spectrometry. The discharge is operated in continuous (direct current) and in pulsed (high power impulse magnetron sputtering, Hi) mode with a Ti target and in Ar gas. Singly-charged Ar.+., Ti.+., and Ar.2..+. and doubly-charged Ar.2+. and Ti.2+. ions are observed. A novel approach is to bias the magnetron anode. Application of a positive anode voltage shifts the kinetic energies of plasma ions by qe.0.V.a., where V.a. is the anode voltage and qe.0. is the ion charge. It allows for an effective control of plasma ion energies.
Permanent Link: http://hdl.handle.net/11104/0327435