0551132 - ÚPT 2022 RIV US eng A - Abstract
Müllerová, Ilona - Konvalina, Ivo - Materna Mikmeková, Eliška
Methods of the electron induced cleanning in SEM.
Microscopy and Microanalysis. Cambridge University Press. Roč. 27, S1 (2021), s. 2016-2017. ISSN 1431-9276. E-ISSN 1435-8115
Institutional support: RVO:68081731
Keywords : SEM * contamination * electron beam cleaning * graphene
OECD category: Electrical and electronic engineering
Result website:
https://www.cambridge.org/core/journals/microscopy-and-microanalysis/article/methods-of-the-electron-induced-cleanning-in-sem/54D0340450B8B0BEA7DAD306BCE1C21BDOI: https://doi.org/10.1017/S1431927621007327

A special technique was developed and tested to clean the specimen and to do the imaging of the individual graphene layers, or other 2D materials, in the standard vacuum conditions of the conventional SEM. Parameters such as the primary electron beam energy, electron dose, sample bias, and scanning rate have been optimized to find the equilibrium between electron stimulated desorption (cleaning) and deposition (contamination).
Permanent Link: http://hdl.handle.net/11104/0326577