Hf.sub.1−x./sub.Zr.sub.x./sub.O.sub.2./sub./ZrO.sub.2./sub. nanolaminate thin films as a high‑κ dielectric

0551091 - FZÚ 2022 RIV US eng J - Journal Article
Kashir, Alireza - Farahani, M.G. - Kamba, Stanislav - Yadav, M. - Hwang, H.
Hf_1−xZr_xO₂/ZrO₂ nanolaminate thin films as a high‑κ dielectric.
ACS Applied Electronic Materials. Roč. 3, č. 12 (2021), s. 5632-5640. E-ISSN 2637-6113
R&D Projects: GA MŠMT(CZ) EF16_019/0000760; GA ČR(CZ) GA21-06802S
Grant - others:OP VVV - SOLID21(XE) CZ.02.1.01/0.0/0.0/16_019/0000760
Institutional support: RVO:68378271
Keywords : ferroelectric * antiferroelectric * thin films * permittivity
OECD category: Condensed matter physics (including formerly solid state physics, supercond.)
Impact factor: 4.494, year: 2021
Method of publishing: Limited access
https://doi.org/10.1021/acsaelm.1c01105

We investigated dielectric and structural properties of ~10 nm thin films consisting of stacked 1 nm thin ferroelectric (FE) Hf1−xZrxO2 (HZO(x)) and antiferroelectric (AFE) ZrO2 layers. At x < 0.5, the measurements of polarization vs electric field revealed pure FE hysteresis loops, whereas at x > 0.5, pinched hysteresis loops with some remnant polarization were observed, which indicate a coexistence of FE and AFE orderings. In this way, we demonstrate that the coexistence of FE and AFE orderings can be controlled by adjusting the composition of HZO(x) layers in the HZO(x)/ZrO2 nanolaminate films. At x = 0.5, the dielectric constant is ~ 60 in nanolaminate films, which is much higher than that of the conventional HZO(x) solid solution thin films. Structural investigations confirm a coexistence of polar orthorhombic and nonpolar tetragonal structures, which is consistent with the observed polarization hysteresis loops.
Permanent Link: http://hdl.handle.net/11104/0327442