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In-situ plasma monitoring by optical emission spectroscopy during pulsed laser deposition of doped Lu.sub.2./sub.O.sub.3./sub.

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    0546180 - FZÚ 2022 RIV DE eng J - Journal Article
    Irimiciuc, Stefan - More Chevalier, Joris - Chertopalov, Sergii - Fekete, Ladislav - Novotný, Michal - Havlová, Šárka - Poupon, Morgane - Zikmund, Tomáš - Kůsová, Kateřina - Lančok, Ján
    In-situ plasma monitoring by optical emission spectroscopy during pulsed laser deposition of doped Lu2O3.
    Applied Physics B-Lasers and Optics. Roč. 127, č. 10 (2021), s. 1-9, č. článku 140. ISSN 0946-2171. E-ISSN 1432-0649
    R&D Projects: GA MŠk(CZ) EF16_019/0000760; GA ČR GA18-17834S
    Grant - others: OP VVV - SOLID21(XE) CZ.02.1.01/0.0/0.0/16_019/0000760
    Institutional support: RVO:68378271
    Keywords : expansion * dynamics * ablation * target * oxides
    OECD category: Coating and films
    Impact factor: 2.070, year: 2020

    The control and arguably the tailoring aspect of technologies like pulsed laser deposition (PLD) rises from understanding the chemistry hidden by the laser generated plasma. With the continuous transition towards thin films with complex structures and geometries, the comprehension of the fundamental processes during the film deposition becomes critical. During the PLD of Mo and Eu-doped Lu2O3, optical emission spectroscopy was implemented for in-situ plasma monitoring. The spatial distribution of individual elements revealed the structuring of a stoichiometric plasma while the formation of LuO molecule within the plasma plume is seen as being induced by the addition of a minimum 1 Pa of O2. The energy of the ejected particles was controlled through doping and O2 pressure.
    Permanent Link: http://hdl.handle.net/11104/0322752

     
     
Number of the records: 1