Photoinduced Resist-free Imprinting (PRI) in fullerene thin films as revealed by Grazing Incidence Small-angle X-ray scattering

0541681 - ÚFCH JH 2022 RIV NL eng J - Journal Article
Gutiérrez-Fernández, E. - Rodriguez, Álvaro - García-Gutiérrez, M. C. - Nogales, A. - Rebollar, E. - Solano, E. - Ezquerra, T. A.
Photoinduced Resist-free Imprinting (PRI) in fullerene thin films as revealed by Grazing Incidence Small-angle X-ray scattering.
Applied Surface Science. Roč. 548, MAY 2021 (2021), č. článku 149254. ISSN 0169-4332. E-ISSN 1873-5584
Institutional support: RVO:61388955
Keywords : Photoinduced Resist-free Imprinting (PRI) * Grazing Incidence Small-angle X-ray Scattering (GISAXS) * Laser Induced Periodic Surface Structures (LIPSS) * Fullerene (PCBM)
OECD category: Physical chemistry
Impact factor: 7.392, year: 2021
Method of publishing: Limited access

In this article we explore the potential of synchrotron Grazing Incidence Small Angle X-ray Scattering (GISAXS) to evaluate the extension of a Photoinduced Resist-free Imprinting (PRI) effect for grating-like Laser Induced Periodic Surface Structures (LIPSS) on spin-coated thin films of the fullerene derivative [6,6]-phenyl C-71-butyric acid methyl ester (PC71BM). Valuable information about the nature of both the original fullerene LIPSS and of the remaining resist-free nanostructure in terms of geometry, size distribution, lattice periodicity and degree of order can be achieved by simulations of the GISAXS patterns. One of the most interesting features provided by the GISAXS analysis is the estimation of the paracrystalline distortion factor, which can be useful to evaluate the level of order in the nanostructure. Data revealed that LIPSS in PC71BM films can be described as onedimensional paracrystalline lattices with levels of order in accordance with those typically observed in LIPSS of other materials. The PRI effect leaves a qualitatively similar nanostructure but about two times more disordered than the original LIPSS one. Our results show that GISAXS is a powerful tool to characterize Resist-free Imprinting procedures of potential relevance in nanotechnology.
Permanent Link: http://hdl.handle.net/11104/0319212