Number of the records: 1
Sideways deposition rate and ionized flux fraction in dc and high power impulse magnetron sputtering
- 1.0533965 - FZÚ 2021 RIV US eng J - Journal Article
Hajihoseini, H. - Čada, Martin - Hubička, Zdeněk - Ünaldi, S. - Raadu, M.A. - Brenning, N. - Gudmundsson, J.T. - Lundin, D.
Sideways deposition rate and ionized flux fraction in dc and high power impulse magnetron sputtering.
Journal of Vacuum Science & Technology A : Vacuum, Surfaces and Films. Roč. 38, č. 3 (2020), s. 1-11, č. článku 033009. ISSN 0734-2101. E-ISSN 1520-8559
R&D Projects: GA MŠMT(CZ) EF16_019/0000760; GA ČR GA19-00579S
Grant - others:OP VVV - SOLID21(XE) CZ.02.1.01/0.0/0.0/16_019/0000760
Institutional support: RVO:68378271
Keywords : plasma * ion flux * HiPIMS * sputtering
OECD category: Fluids and plasma physics (including surface physics)
Impact factor: 2.427, year: 2020
Method of publishing: Limited access
https://doi.org/10.1116/1.5145292
The sideways (radial) deposition rate and ionized flux fraction in a high power impulse magnetron sputtering (HiPIMS) discharge are studied and compared to a dc magnetron sputtering (dcMS) discharge, while the magnetic field strength and degree of balancing are varied.
Permanent Link: http://hdl.handle.net/11104/0312189
Number of the records: 1