Nanosphere lithography for structuring polycrystalline diamond films

0533915 - FZÚ 2021 RIV CH eng J - Journal Article
Domonkos, Mária - Demo, Pavel - Kromka, Alexander
Nanosphere lithography for structuring polycrystalline diamond films.
Crystals. Roč. 10, č. 2 (2020), s. 1-14, č. článku 118. ISSN 2073-4352. E-ISSN 2073-4352
R&D Projects: GA MŠMT(CZ) EF16_019/0000760; GA MŠMT LM2018110
Grant - others:OP VVV - SOLID21(XE) CZ.02.1.01/0.0/0.0/16_019/0000760
Institutional support: RVO:68378271
Keywords : diamond thin films * nanosphere lithography * polystyrene spheres * reactive ion etching
OECD category: Optics (including laser optics and quantum optics)
Impact factor: 2.589, year: 2020
Method of publishing: Open access

This paper deals with the structuring of polycrystalline diamond thin films using the technique of nanosphere lithography. The presented multistep approaches relied on a spin-coated self-assembled monolayer of polystyrene spheres, which served as a lithographic mask for the further custom nanofabrication steps. The size and shape of the lithographic mask was altered using oxygen plasma etching. The periodicity of the final structure was defined by the initial diameter of the spheres. The advantages and limitations of the fabrication technique are discussed. Finally, the potential applications (e.g., photonics, plasmonics) of the obtained nanostructures are reviewed.

Permanent Link: http://hdl.handle.net/11104/0312141