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Photo-electrochemical stability of copper oxide photocathodes deposited by reactive high power impulse magnetron sputtering

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    0512095 - FZÚ 2020 RIV NL eng J - Journal Article
    Hubička, Zdeněk - Zlámal, M. - Čada, Martin - Kment, Štěpán - Krysa, J.
    Photo-electrochemical stability of copper oxide photocathodes deposited by reactive high power impulse magnetron sputtering.
    Catalysis Today. Roč. 328, May (2019), s. 29-34. ISSN 0920-5861. E-ISSN 1873-4308
    R&D Projects: GA ČR GA17-20008S; GA MŠk(CZ) EF16_019/0000760
    Grant - others: OP VVV - SOLID21(XE) CZ.02.1.01/0.0/0.0/16_019/0000760
    Institutional support: RVO:68378271
    Keywords : high power impulse magnetron sputtering * reactive sputtering * magnetron discharge * photocathode * photocurrent * copper oxide
    OECD category: Condensed matter physics (including formerly solid state physics, supercond.)
    Impact factor: 5.825, year: 2019
    Method of publishing: Limited access
    https://doi.org/10.1016/j.cattod.2018.11.034

    Copper oxide thin films were deposited by a reactive high power impulse magnetron sputtering (r-HIPIMS) on glass substrates with a SnO2:F (FTO) layer. The pulse magnetron discharge was analyzed via the radio frequency (RF) Sobolewski probe, used for the time-resolved measurement of ion flux density on the substrate. Pulsed discharge current and voltage waveforms were analyzed.

    Permanent Link: http://hdl.handle.net/11104/0302301

     
     
Number of the records: 1