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Sculpturing graphene wrinkle patterns into compliant substrates

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    0502546 - ÚFCH JH 2020 RIV US eng J - Journal Article
    Sampathkumar, Krishna - Androulidakis, Ch. - Koukaras, E. N. - Řáhová, Jaroslava - Drogowska, Karolina - Kalbáč, Martin - Vetushka, Aliaksi - Fejfar, Antonín - Galiotis, C. - Frank, Otakar
    Sculpturing graphene wrinkle patterns into compliant substrates.
    Carbon. Roč. 146, MAY 2019 (2019), s. 772-778. ISSN 0008-6223. E-ISSN 1873-3891
    R&D Projects: GA ČR(CZ) GA17-18702S; GA MŠMT EF16_026/0008382
    EU Projects: European Commission(XE) 696656 - GrapheneCore1
    Institutional support: RVO:61388955 ; RVO:68378271
    Keywords : graphene * wrinkle patterns * Chemical vapor deposition
    OECD category: Physical chemistry; Condensed matter physics (including formerly solid state physics, supercond.) (FZU-D)
    Impact factor: 8.821, year: 2019
    Method of publishing: Limited access

    In this work we present a fabrication process for sculpturing wrinkled structures into soft polymers by thermal treatment of graphene flakes. This is accomplished by the imposition of a biaxial compressive stress field to the graphene flakes by controlled heating of graphene/polymer composites. The wrinkling patterns (amplitude, wavelength) are linearly related to the thickness of the graphene as in the case of a stiff film deposited on a compliant substrate. The orientation of the wrinkles is controlled by the geometry of the flakes, such as that long and narrow flakes exhibit perfectly parallel wrinkles perpendicular to the longer edge, while more equilateral specimens are wrinkled without any preferred orientation in the flake interior. Kelvin probe measurements showed that this type of wrinkling does not affect the surface potential of the graphene flakes. The universality of the technique is validated by sculpturing two different polymers, using mechanically exfoliated flakes as well as large graphene prepared by chemical vapor deposition. We thus demonstrate that the present approach is an excellent method for patterning the surface of soft matter in a number of applications with nanoscale features of lateral dimensions as low as ∼50 nm.
    Permanent Link: http://hdl.handle.net/11104/0294452

     
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