Damage accumulation in thin ruthenium films induced by repetitive exposure to femtosecond XUV pulses below the single-shot ablation threshold

0497873 - FZÚ 2019 RIV US eng J - Journal Article
Makhotkin, I.A. - Milov, I. - Chalupský, Jaromír - Tiedtke, K. - Enkisch, H. - de Vries, G. - Scholze, F. - Siewert, F. - Sturm, J.M. - Nikolaev, K. - van de Kruijs, R.W.E. - Smithers, M.A. - van Wolferen, H.A.G.M. - Keim, E.G. - Louis, E. - Jacyna, I. - Jurek, M. - Klinger, D. - Pelka, J. B. - Juha, Libor - Hájková, Věra - Vozda, Vojtěch - Burian, Tomáš - Saksl, Karel - Faatz, B. - Keitel, B. - Ploenjes, E. - Schreiber, S. - Toleikis, S. - Loch, R. - Hermann, M. - Strobel, S. - Donker, R. - Mey, T. - Sobierajski, R.
Damage accumulation in thin ruthenium films induced by repetitive exposure to femtosecond XUV pulses below the single-shot ablation threshold.
Journal of the Optical Society of America. B. Roč. 35, č. 11 (2018), s. 2799-2805. ISSN 0740-3224. E-ISSN 1520-8540
R&D Projects: GA ČR(CZ) GA17-05167s; GA MŠMT LG15013; GA ČR(CZ) GA14-29772S
Institutional support: RVO:68378271
Keywords : interaction of femtosecond XUV pulses * single-shot ablation threshold * damage accumulation in thin ruthenium films
OECD category: Optics (including laser optics and quantum optics)
Impact factor: 2.284, year: 2018

The process of damage accumulation in thin ruthenium films exposed to multiple femtosecond extreme ultraviolet (XUV) free-electron laser (FEL) pulses below the critical angle of reflectance at the FEL facility in Hamburg (FLASH) was experimentally analyzed. The multi-shot damage threshold is found to be lower than the single-shot damage threshold. Detailed analysis of the damage morphology and its dependence on irradiation conditions justifies the assumption that cavitation induced by the FEL pulse is the prime mechanism responsible for multi-shot damage in optical coatings.
Permanent Link: http://hdl.handle.net/11104/0290344