Electron attachment to hexafluoropropylene oxide (HFPO)

0497402 - ÚFCH JH 2019 RIV US eng J - Journal Article
Zawadski, Mateusz Ernest - Chacherau, A. - Kočišek, Jaroslav - Franck, C. M. - Fedor, Juraj
Electron attachment to hexafluoropropylene oxide (HFPO).
Journal of Chemical Physics. Roč. 149, č. 20 (2018), č. článku 204305. ISSN 0021-9606. E-ISSN 1089-7690
R&D Projects: GA ČR GA17-04844S
Institutional support: RVO:61388955
Keywords : electron attachment * Crossed-beam experiment * Hexafluoropropylene oxide
OECD category: Physical chemistry
Impact factor: 2.997, year: 2018

We probe the electron attachment in hexafluoropropylene oxide (HFPO), C3F6O, a gas widely used in plasma technologies. We determine the absolute electron attachment cross section using two completely different experimental approaches: (i) a crossed-beam experiment at single collision conditions (local pressures of 5 × 10−4 mbar) and (ii) a pulsed Townsend experiment at pressures of 20–100 mbar. In the latter method, the cross sections are unfolded from the electron attachment rate coefficients. The cross sections derived independently by the two methods are in very good agreement. We additionally discuss the dissociative electron attachment fragmentation patterns and their role in the radical production in industrial HFPO plasmas.
Permanent Link: http://hdl.handle.net/11104/0289972