Positive ionization and electron attachment of hexafluoropropylene oxide in different cluster environments

0495943 - ÚFCH JH 2020 RIV NL eng J - Journal Article
Pysanenko, Andriy - Kollárová, Dominika - Fedor, Juraj - Kočišek, Jaroslav - Fárník, Michal
Positive ionization and electron attachment of hexafluoropropylene oxide in different cluster environments.
International Journal of Mass Spectrometry. Roč. 435, JAN 2019 (2019), s. 145-150. ISSN 1387-3806. E-ISSN 1873-2798
R&D Projects: GA ČR(CZ) GA17-04068S; GA ČR GA17-04844S
Institutional support: RVO:61388955
Keywords : Cluster fragmentation * Electron attachment * HFPO polymerization * Pickup of molecules on clusters
OECD category: Physical chemistry
Impact factor: 2.090, year: 2019
Method of publishing: Limited access

The hexafluoropropylene oxide, C3F6O (HFPO), is commonly used in technological processes involving low-temperature plasmas. In relevance to such processes, we investigate the electron ionization and attachment to HFPO molecules in various cluster environments. Either pure (HFPO)N clusters or the clusters deposited on larger argon nanoparticles (HFPO)N·ArM are generated in molecular beams in vacuum. The cluster beam is intercepted with a beam of either slow (0–15 eV) or faster (70 eV) electrons, yielding negative or positive ions, respectively, and their mass spectra are recorded. Qualitatively, the spectra of free and Ar-deposited clusters are similar, exhibiting the same ion fragments. The cluster environment suppresses the fragmentation after ionization for both positively and negatively charged clusters, namely, the parent ions (HFPO)n+/− are present in the spectra. The fragmentation is more suppressed in the Ar-deposited clusters. In both the positive ionization and attachment, new fragmentation channels or ion-molecule reactions in the clusters lead to production of new fragments not observed in the gas phase. Mechanisms of these reactions and ionization processes are discussed.
Permanent Link: http://hdl.handle.net/11104/0288792