Thermal desorption spectroscopy in prototype furnace for chemical vapor deposition

0494371 - ÚPT 2019 RIV CZ eng C - Conference Paper (international conference)
Průcha, Lukáš - Daniel, Benjamin - Piňos, Jakub - Mikmeková, Eliška
Thermal desorption spectroscopy in prototype furnace for chemical vapor deposition.
Recent Trends in Charged Particle Optics and Surface Physics Instrumentation. Proceedings of the 16th International Seminar. Brno: Institute of Scientific Instruments The Czech Academy of Sciences, 2018, s. 60-61. ISBN 978-80-87441-23-7.
[Recent Trends in Charged Particle Optics and Surface Physics Instrumentation. Skalský dvůr (CZ), 04.06.2018-08.06.2018]
R&D Projects: GA TA ČR(CZ) TE01020118; GA MŠMT(CZ) LO1212; GA MŠMT ED0017/01/01
Institutional support: RVO:68081731
Keywords : thermal desorption spectroscopy * CVD * surface cleaning * silicon
OECD category: Electrical and electronic engineering

Cleaning of the sample surfaces is crucial for scanning electron microscopy, especially for
low energy electron microscopy or for the deposition of thin layers, such as graphene,
where surface has to be well prepared. In the best case, every unwanted particle should be
cleaned from the sample surface for best low energy electron microscopy observation or thin
film deposition. Unfortunately, the standard cleaning procedures can leave residues on the
sample surface. This work is focused on thermal desorption spectroscopy (TDS). TDS is a method of observing desorbed molecules from a sample surface during the increase of
temperature of the sample. The aim of this study was to determine optimum conditions:
temperature and time, to achieve clean surfaces in the shortest time.
Permanent Link: http://hdl.handle.net/11104/0287627