Hiding e-beam exposure fields by deterministic 2D pattering

0494364 - ÚPT 2019 RIV CZ eng C - Conference Paper (international conference)
Horáček, Miroslav - Knápek, Alexandr - Matějka, Milan - Krátký, Stanislav - Urbánek, M. - Mika, Filip - Kolařík, Vladimír
Hiding e-beam exposure fields by deterministic 2D pattering.
Recent Trends in Charged Particle Optics and Surface Physics Instrumentation. Proceedings of the 16th International Seminar. Brno: Institute of Scientific Instruments The Czech Academy of Sciences, 2018, s. 36-37. ISBN 978-80-87441-23-7.
[Recent Trends in Charged Particle Optics and Surface Physics Instrumentation. Skalský dvůr (CZ), 04.06.2018-08.06.2018]
R&D Projects: GA TA ČR TE01020233; GA TA ČR TG03010046; GA MŠMT(CZ) LO1212; GA MŠMT ED0017/01/01
Institutional support: RVO:68081731
Keywords : phyllotaxis * electron beam lithography
OECD category: Optics (including laser optics and quantum optics)

The high stability and good current homogeneity in the spot of the e-beam writer is crucial to
the exposure quality, particularly in the case of large-area structures when gray-scale
lithography is used. Even though the deflection field distortion is calibrated regularly and
beam focus and beam astigmatism is dynamically corrected over the entire deflection field, we can observe disturbances in the exposed relief.
Recently, we presented a method that makes use of e–beam exposure imperfection by
introducing marginally visible high–frequency diffraction gratings of variable pitch that fill in
separate orthogonal exposure fields. The actually presented approach follows up our
research on aperiodic arrangements of optical primitives, especially on the phyllotactic–
like arrangement of sub–micron relief optical elements. This approach is extended from the
diffraction element arrangement to the higher level of exposure fields arrangements.
Permanent Link: http://hdl.handle.net/11104/0287595