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Towards high quality ITO coatings: the impact of nitrogen admixture in HiPIMS discharges
- 1.0489659 - FZÚ 2019 RIV CH eng J - Journal Article
Straňák, V. - Bogdanowicz, R. - Sezemsky, P. - Wulff, H. - Kruth, A. - Smietana, M. - Kratochvíl, J. - Čada, Martin - Hubička, Zdeněk
Towards high quality ITO coatings: the impact of nitrogen admixture in HiPIMS discharges.
Surface and Coatings Technology. Roč. 335, Feb (2018), s. 126-133. ISSN 0257-8972
Institutional support: RVO:68378271
Keywords : film properties * HiPIMS * ITO * plasma deposition
OECD category: Fluids and plasma physics (including surface physics)
Impact factor: 3.192, year: 2018
The paper reports controlled deposition of optically transparent and electrically conductive ITO films prepared by a combination of rf (13.56 MHz) and High Power Impulse Magnetron Sputtering (HiPIMS) systems without any post deposition thermal treatment/annealing. It is shown that (i) reactive admixture of N-2 gas to the process and (ii) pressure in the deposition chamber enable to optimize optical properties of ITO films. Furthermore, the changes of electrical resistivity were observed, too. The variation of these ITO properties is attributed to change of crystalline structure measured by XRD methods.
Permanent Link: http://hdl.handle.net/11104/0284031
Number of the records: 1