Application of low temperature plasma jet systems for the deposition of thin films

0485935 - FZÚ 2018 RIV CZ eng C - Conference Paper (international conference)
Hubička, Zdeněk - Kment, Štěpán - Olejníček, Jiří - Čada, Martin - Straňák, V. - Klusoň, J. - Tichý, M. - Klusoň, Petr
Application of low temperature plasma jet systems for the deposition of thin films.
XIXth Symposium on Physics of Switching Arc. Brno: Brno University of Technology, 2011 - (Aubrecht, V.), s. 47-56. ISBN 978-163266006-0.
[XIXth Symposium on Physics of Switching Arc. Brno (CZ), 05.09.2011-11.09.2011]
R&D Projects: GA ČR(CZ) GAP205/11/0386; GA AV ČR KAN400720701
Institutional research plan: CEZ:AV0Z10100522
Institutional support: RVO:68378271 ; RVO:67985858
Keywords : plasma jet * TiO2 thin film * photocatalytic * XRD * IVDF * RFA
OECD category: Fluids and plasma physics (including surface physics); Inorganic and nuclear chemistry (UCHP-M)

The low pressure DC pulsed or RF pulsed modulated hollow cathode plasma jets worked on the principle of the reactive sputtering of the hollow cathode usually in the gas mixture of Ar + O2 or N2. The DC pulsed power supplier was applied with combination of the RF source for the plasma jets generation. It was clearly demonstrated that properties of TiO2 and TiO2:N films significantly depended on the plasma parameters. First, the produced films were characterized with the aid of a number of methods (AFM, SEM, XRD, Raman spectroscopy, X-ray photoelectron spectroscopy (XPS), UV–vis spectrometry). Further, the films were judged in terms of their specific optical functionality to generate photocurrents upon being illuminated with spectrally well defined narrow light beams. The parameters of the chemically reactive plasma in the jets were determined using the time-resolved Langmuir probe system. The measurement of the ion energy distribution function was performed by means of the RFA.
Permanent Link: http://hdl.handle.net/11104/0280850