In-situ formation of magnesium silicide nanoparticles on the surface of the hydrogenated silicon films

0479007 - FZÚ 2018 RIV JP eng C - Conference Paper (international conference)
Stuchlíková, The-Ha - Píč, Vlastimil - Ledinský, Martin - Purkrt, Adam - Remeš, Zdeněk - Stuchlík, Jiří
In-situ formation of magnesium silicide nanoparticles on the surface of the hydrogenated silicon films.
JJAP Conference Proceedings vol. 5. Tokyo: The Japan Society of Applied Physics, 2017 - (Asano, T.), s. 1-5, č. článku 011303. ISBN 978-4-86348-617-1.
[Asia-Pacific Conference on Semiconducting Silicides and Related Materials — Science and Technology Towards Sustainable Electronics (APAC Silicide 2016). Fukuoka (JP), 16.07.2016-18.07.2016]
R&D Projects: GA ČR GA13-12386S
Grant - others:AV ČR(CZ) KONNECT-007
Program: Bilaterální spolupráce
Institutional support: RVO:68378271
Keywords : silicides * amorphous silicon
OECD category: Condensed matter physics (including formerly solid state physics, supercond.)

The magnesium silicide nanoparticles were formed on the surface of hydrogenated silicon thin films by thermal evaporation, annealing and hydrogen plasma treatment. The high reactivity of silicon and magnesium leads to the self-formation of magnesium silicide nanoparticles (NPs). The reaction is stimulated in-situ by the low pressure hydrogen plasma. The presence of Mg2Si NPs was confirmed by SEM and Raman spectroscopy. The photothermal deflection spectroscopy (PDS) shows the enhanced optical absorption in the near infrared spectrum. The diode structures with in-situ embedded Mg2Si NPs were characterized by the volt-ampere measurements in dark and under AM1.5 spectrum.
Permanent Link: http://hdl.handle.net/11104/0275058